OVERVIEW
Silicon Deposition Gases are high-purity semiconductor process materials used in silicon-containing film deposition and related wafer-fabrication steps. Based on our current semiconductor materials portfolio, Synergi can support selected silicon precursors including silane, disilane, dichlorosilane and trichlorosilane.
CORE PRODUCTS
Silane
Silicon-containing specialty gas used in semiconductor deposition and selected thin-film manufacturing processes.
Disilane
High-purity silicon precursor used in selected semiconductor deposition processes requiring enhanced silicon reactivity.
Dichlorosilane
Silicon precursor used in selected semiconductor deposition processes and silicon-containing film formation.
Trichlorosilane
Silicon precursor used in polysilicon production and related silicon-material manufacturing applications.
APPLICATIONS
PRODUCT RANGE
| Product | Formula | Primary Use | Portfolio Status |
|---|---|---|---|
| Silane | SiH₄ | Deposition gas | Available through selected supply partners |
| Disilane | Si₂H₆ | Deposition gas | Available through selected supply partners |
| Dichlorosilane | DCS | Deposition precursor | Available through selected supply partners |
| Trichlorosilane | TCS | Polysilicon production / silicon precursor | Available through selected supply partners |
The current source material identifies these products and their general semiconductor applications, but does not provide purity, cylinder size, pressure, concentration or detailed commercial specifications. These should be confirmed from the current supplier TDS / COA before publication.
